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Polishing resin for semiconductor material production

INQUIRY
Catalog Number ACMA00034180
Application ·Semiconductor material production in the electronics industry
·Ultra-pure water machines and water treatment systems in laboratories, hospitals, etc.
Color Form Brownish yellow
Effective Size 0.4 - 0.7mm
Functional Group Sulfonic Acid/ Quarternary Amine
Max Temperature Range Limited 80℃
Moisture Content 52-60%
Particle Size Range 0.4-1.25mm(≥95)
pH Range 0-14
Physical Description Spherical Beads
Shipping Weight 0.68-0.76g/mL
Specific Density 1.08-1.15g/ml
Uniformity Coefficient ≤1.6
Q&A

What is the purpose of polishing resins in semiconductor manufacturing?

The purpose of polishing resins is to provide the final polishing service in the highest purity water treatment applications in semiconductor manufacturing.

What is the importance of ultra-pure water (UPW) in semiconductor processing?

Ultra-pure water is essential for processing wafers and carrying out complex wet chemical procedural steps in photolithography. It is necessary to prevent deposits or impurities that could lead to production faults and high reject rates.

What are some examples of semiconductor components that require UPW?

Some examples of semiconductor components that require UPW include computer processors, memory chips, light-emitting diodes (LEDs), liquid crystal (LC) and LED displays, and photovoltaic modules.

Why are the quality requirements for UPW becoming increasingly stringent?

As electronics advances towards smaller dimensions, the quality requirements for UPW are becoming increasingly stringent to ensure the production of high-quality semiconductor components without any defects or impurities.

What is the purpose of final polishing in UPW treatment?

Final polishing is the last purification step for UPW, where traces of ions in the ppb and even ppt ranges are removed to meet the highest purity requirements for the production of highly integrated microprocessors and other semiconductor components.

What are the specifications that final polishing must adhere to?

Final polishing must adhere to specifications for electrical resistivity, residual content of metal ions (such as silicate and borate), and particle limits to ensure smooth and efficient production of high-quality semiconductor components.

Why is complex water treatment necessary for semiconductor manufacturing?

Complex water treatment is necessary to ensure that the water used in semiconductor manufacturing is of the required purity. The latest generation of wafers and microchips demand a high level of quality, and new analytical systems can analyze ions in extremely low concentrations.

What are some of the treatment steps involved in producing ultra-pure water?

The treatment steps for producing ultra-pure water include conventional primary demineralization with standard ion exchange resins, reverse osmosis, degasification, ultrafiltration, hydrogen peroxide removal, and final polishing with an ultra-pure mixed bed.

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